✦ LIBER ✦
Impact of Ge implantation on the electrical characteristics of TiSi 2 p+/n shallow junctions with an a-Si (or a poly-Si) buffer layer
✍ Scribed by Cheng Tung Huang; Tan Fu Lei
- Book ID
- 114536762
- Publisher
- IEEE
- Year
- 1997
- Tongue
- English
- Weight
- 388 KB
- Volume
- 44
- Category
- Article
- ISSN
- 0018-9383
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