Imaging of the lateral GOI-defect distribution in silicon MOS wafers with lock-in IR-thermography

✍ Scribed by S. Huth; O. Breitenstein; U. Lambert; A. Huber

• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 273 KB
• Volume: 4
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/s1369-8001(00)00145-1