๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

[IEEE UGIM Symposium, Microelectronics Education for the Future. Twelfth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.97CH36030) - Rochester, NY, USA (20-23 July 1997)] Proceedings of the UGIM Symposium, Microelectronics Education for the Future. Twelfth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.97CH36030) - Effect of shadowing ion energy flux and neutral flux and isotropic neutral flux on plasma etching profiles

โœ Scribed by Wang, C.D.; Abraham-Shrauner, B.


Book ID
126676907
Publisher
IEEE
Year
1997
Tongue
English
Weight
79 KB
Category
Article
ISBN-13
9780780337909

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โœฆ Synopsis


The purpose of this symposium is to discuss education and research programs in microelectronics. Recent results are presented including new educational program initiatives and research results. Most universities involved in microelectronics worldwide have been represented at past conferences and are participating again this year.


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