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[IEEE The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. - Traverse City, MI, USA (2006.06.4-2006.06.8)] The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. - Deposition uniformity of ultra nano crystalline diamond on 6" and 8" wafer substrates using a 915MHz plasma assisted CVD diamond reactor

✍ Scribed by Ziervogel, R.; Yaran, M.K.; Becker, M.F.; Schuelke, T.; Asmussen, J.

Book ID: 121256474
Publisher: IEEE
Year: 2006
Weight: 147 KB
Category: Article
ISBN-13: 9781424401253
DOI: 10.1109/PLASMA.2006.1707164

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