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[IEEE NUPAD IV. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits, - Seattle, WA (May 31-June 1, 1992)] NUPAD IV. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits, - Fractal Network Diffusicm of Fluorine and Boron in Polysilicon Gates

✍ Scribed by Orlowski, M.; Hsing-Huang Tseng, ; Hance, R.; Tobin, P.J.

Book ID: 120832598
Publisher: IEEE
Year: 1992
Weight: 341 KB
Category: Article
ISBN-13: 9780780305168
DOI: 10.1109/NUPAD.1992.673843

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