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[IEEE Microsystems (ASDAM) - Smolenice, Slovakia (2010.10.25-2010.10.27)] The Eighth International Conference on Advanced Semiconductor Devices and Microsystems - N-doped nanocrystalline silicon carbide films prepared by PECVD technology

✍ Scribed by Bohacek, P.; Huran, J.; Valovic, A.; Kobzev, A.P.; Shvetsov, V.N.; Kucera, M.; Malinovsky, L.

Book ID: 126620207
Publisher: IEEE
Year: 2010
Weight: 72 KB
Category: Article
ISBN: 1424485746
DOI: 10.1109/ASDAM.2010.5666344

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