𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE International Symposium on VLSI Technology, Systems and Applications - Taipei, Taiwan (17-19 May 1989)] International Symposium on VLSI Technology, Systems and Applications - The application of ion-beam mixing, doped silicide, and rapid thermal processing to self-aligned silicide technology

✍ Scribed by Ku, Y.H.; Lee, S.K.; Ting, W.; Kwong, D.L.

Book ID: 126681204
Publisher: IEEE
Year: 1989
Weight: 630 KB
Category: Article
DOI: 10.1109/VTSA.1989.68641

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