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[IEEE International Symposium on Semiconductor Manufacturing - Austin, TX, USA (17-19 Sept. 1995)] Proceedings of International Symposium on Semiconductor Manufacturing - Control of Si surface characteristics by a new etching solution BHF/H/sub 2/O/sub 2/

✍ Scribed by Muramatsu, Y.; Tsuji, M.; Aoto, N.

Book ID: 120030224
Publisher: IEEE
Year: 1995
Weight: 318 KB
Category: Article
ISBN-13: 9780780329287
DOI: 10.1109/ISSM.1995.524356

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