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[IEEE International Electron Devices Meeting 1998. Technical Digest - San Francisco, CA, USA (6-9 Dec. 1998)] International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) - Shallow trench isolation for advanced ULSI CMOS technologies

✍ Scribed by Nandakumar, M.; Chatterjee, A.; Sridhar, S.; Joyner, K.; Rodder, M.; Chen, I.-C.

Book ID: 120163905
Publisher: IEEE
Year: 1998
Weight: 626 KB
Category: Article
ISBN-13: 9780780347748
DOI: 10.1109/IEDM.1998.746297

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