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[IEEE IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science - San Diego, CA, USA (19-22 May 1997)] IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science - Real time characterization of plasma etch selectivity

✍ Scribed by Harper, M.; Sarfaty, M.; Baum, C.; Hershkowitz, N.

Book ID: 126714681
Publisher: IEEE
Year: 1997
Weight: 100 KB
Category: Article
ISBN-13: 9780780339903
DOI: 10.1109/PLASMA.1997.604356

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