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[IEEE IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science - Boston, MA, USA (3-5 June 1996)] IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science - Modeling of RF plasma discharges of CH/sub 4/ for carbon film deposition

✍ Scribed by Nagayama, K.; Farouk, B.; Lee, Y.H.

Book ID: 126634720
Publisher: IEEE
Year: 1996
Weight: 257 KB
Category: Article
ISBN-13: 9780780333222
DOI: 10.1109/PLASMA.1996.550749

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