[IEEE IEEE 2000 International Interconnect Technology Conference - Burlingame, CA, USA (5-7 June 2000)] Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) - Single mask metal-insulator-metal (MIM) capacitor with copper damascene metallization for sub-0.18 μm mixed mode signal and system-on-a-chip (SoC) applications

✍ Scribed by Ruichen Liu, ; Cheng-Yih Lin, ; Harris, E.; Merchant, S.; Downey, S.W.; Weber, G.; Ciampa, N.A.; Wai Tai, ; Lai, W.Y.C.; Morris, M.D.; Bower, J.E.; Miner, J.F.; Frackoviak, J.; Mansfield, W.; Barr, D.; Keller, R.; Chong-Ping Chang, ; Chien-Shing Pai, ; Rogers, S.N.; Gregor, R.

• Book ID: 118071167
• Publisher: IEEE
• Year: 2000
• Weight: 346 KB
• Edition: 2000
• Volume: 0
• Category: Article
• ISBN-13: 9780780363274
• DOI: 10.1109/iitc.2000.854297