✦ LIBER ✦

[IEEE 4th IEEE Conference on Nanotechnology, 2004. - Munich, Germany (16-19 Aug. 2004)] 4th IEEE Conference on Nanotechnology, 2004. - Self-assembled monolayer resists for electron beam lithography

✍ Scribed by Koswatta, S.O.; Scott, A.D.; Bhattacharya, S.; Janes, D.B.

No coin nor oath required. For personal study only.

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