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[IEEE 30th International Conference on Plasma Science - Jeju, South Korea (2-5 June 2003)] The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. - Surface contaminants cleaning characteristics of etched Si wafer in SF/sub 6/ ICP

✍ Scribed by Byung-Joon Chun, ; Hyun-Jig Song, ; Kwang-Sik Lee,

Book ID: 120182213
Publisher: IEEE
Year: 2003
Weight: 77 KB
Category: Article
ISBN-13: 9780780379114
DOI: 10.1109/PLASMA.2003.1228550

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