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[IEEE 2014 15th International Conference on Ultimate Integration on Silicon (ULIS) - Stockholm, Sweden (2014.04.7-2014.04.9)] 2014 15th International Conference on Ultimate Integration on Silicon (ULIS) - Assessment of technological device parameters by low-frequency noise investigation in SOI omega-gate nanowire NMOS FETs

✍ Scribed by Koyama, M.; Casse, M.; Barraud, S.; Ghibaudo, G.; Iwai, H.; Reimbold, G.

Book ID: 125847737
Publisher: IEEE
Year: 2014
Weight: 733 KB
Category: Article
ISBN: 1479937185
DOI: 10.1109/ULIS.2014.6813905

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