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[IEEE 2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2013.4.22-2013.4.24)] 2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Random interface trap induced fluctuation in 22nm high-k/metal gate junctionless and inversion-mode FinFETs

✍ Scribed by Yijiao Wang, ; Kangliang Wei, ; Xiaoyan Liu, ; Gang Du, ; Jinfeng Kang,

Book ID: 125520045
Publisher: IEEE
Year: 2013
Weight: 940 KB
Category: Article
ISBN: 1467364223
DOI: 10.1109/VLSI-TSA.2013.6545647

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