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[IEEE 2012 International Conference on Enabling Science and Nanotechnology (ESciNano) - Johor Bahru, Malaysia (2012.01.5-2012.01.7)] 2012 International Conference on Enabling Science and Nanotechnology - Fabrication of 20 nm deep silicon dioxide channel using electron beam lithography for manipulation of DNA molecules

✍ Scribed by Rad, Maryam Alsadat; Ibrahim, Kamarulazizi

Book ID: 120710241
Publisher: IEEE
Year: 2012
Weight: 175 KB
Category: Article
ISBN: 1457707977
DOI: 10.1109/ESciNano.2012.6149651

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