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[IEEE 2012 13th International Conference on Ultimate Integration on Silicon (ULIS) - Grenoble, France (2012.03.6-2012.03.7)] 2012 13th International Conference on Ultimate Integration on Silicon (ULIS) - Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2

✍ Scribed by Martin, Dominik; Yurchuk, Ekaterina; Muller, Stefan; Muller, Johannes; Paul, Jan; Sundquist, Jonas; Slesazeck, Stefan; Schloesser, Till; van Bentum, Ralf; Trentzsch, Martin; Schroeder, Uwe; Mikojajick, Thomas

Book ID: 125847736
Publisher: IEEE
Year: 2012
Weight: 177 KB
Category: Article
ISBN: 1467301906
DOI: 10.1109/ULIS.2012.6193391

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