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[IEEE 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS) - Wanchai, Hong Kong, China (2010.01.24-2010.01.28)] 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS) - New photoresist coating method for high topography surfaces

✍ Scribed by Zandi, Kazem; Zhao, Ying; Schneider, Juan; Peter, Yves-Alain

Book ID: 121325118
Publisher: IEEE
Year: 2010
Weight: 558 KB
Category: Article
ISBN: 1424457610
DOI: 10.1109/MEMSYS.2010.5442482

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