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[IEEE 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS) - Wanchai, Hong Kong, China (2010.01.24-2010.01.28)] 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS) - Aluminum nitride as a masking material for the plasma etching of silicon carbide structures

✍ Scribed by Senesky, Debbie G.; Pisano, Albert P.

Book ID: 121323138
Publisher: IEEE
Year: 2010
Weight: 314 KB
Category: Article
ISBN: 1424457610
DOI: 10.1109/MEMSYS.2010.5442492

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