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[IEEE 2009 18th IEEE International Symposium on the Applications of Ferroelectrics (ISAF) - Xian, China (2009.08.23-2009.08.27)] 2009 18th IEEE International Symposium on the Applications of Ferroelectrics - Recrystallization of the copper bottom electrode during complex oxide deposition onto kapton films

✍ Scribed by Suchaneck, G.; Hubicka, Z.; Levin, A.A.; Gunther, S.; Cada, M.; Dejneka, A.; Jastrabik, L.; Meyer, D.C.; Schultheiss, E.; Gerlach, G.

Book ID: 121209115
Publisher: IEEE
Year: 2009
Weight: 227 KB
Category: Article
DOI: 10.1109/ISAF.2009.5307558

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