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[IEEE 2008 2nd IEEE International Nanoelectronics Conference - Shanghai, China (2008.03.24-2008.03.27)] 2008 2nd IEEE International Nanoelectronics Conference - Fabrication, optimization and application of complementary Multiple-Gate Tunneling FETs

✍ Scribed by Fulde, M.; Heigl, A.; Weis, M.; Wimshofer, M.; Arnim, K. v.; Nirschl, Th.; Sterkel, M.; Knoblinger, G.; Hansch, W.; Wachutka, G.; Schmitt-Landsiedel, D.

Book ID: 120212596
Publisher: IEEE
Year: 2008
Weight: 254 KB
Category: Article
ISBN: 1424415721
DOI: 10.1109/INEC.2008.4585554

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