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[IEEE 2007 International Conference on Control, Automation and Systems - Seoul, South Korea (2007.10.17-2007.10.20)] 2007 International Conference on Control, Automation and Systems - Modified PCA algorithm for the end point monitoring of the small open area plasma etching process using the whole optical emission spectra

✍ Scribed by Kyounghoon Han, ; Kun Joo Park, ; Heeyeop Chae, ; En Sup Yoon,

Book ID: 121289758
Publisher: IEEE
Year: 2007
Weight: 379 KB
Category: Article
DOI: 10.1109/ICCAS.2007.4407024

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