✦ LIBER ✦
[IEEE 2007 IEEE Symposium on VLSI Technology - Kyoto, Japan (2007.06.12-2007.06.14)] 2007 IEEE Symposium on VLSI Technology - VFB Roll-off in HfO2 Gate Stack after High Temperature Annealing Process - A Crucial Role of Out-diffused Oxygen from HfO2 to Si
✍ Scribed by Akiyama, K.; Wang, W.; Mizubayashi, W.; Ikeda, M.; Ota, H.; Nabatame, T.; Toriumi, A.
- Book ID
- 126670108
- Publisher
- IEEE
- Year
- 2007
- Weight
- 494 KB
- Category
- Article
- ISBN
- 4900784036
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