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[IEEE 2007 Digest of papers Microprocesses and Nanotechnology - Kyoto, Japan (2007.11.5-2007.11.8)] 2007 Digest of papers Microprocesses and Nanotechnology - Electron beam lithography simulation for the patterning of EUV masks

✍ Scribed by Tsikrikas, N.; Patsis, G. P.; Valamontes, E.; Raptis, I.; Gerardino, A.

No coin nor oath required. For personal study only.

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