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[IEEE 2004 IEEE International Reliability Physics Symposium. - Phoenix, AZ, USA (25-29 April 2004)] 2004 IEEE International Reliability Physics Symposium. Proceedings - The influence of heavily doped buried layer implants on electrostatic discharge (ESD), latchup, and a silicon germanium heterojunction bipolar transistor in a BiCMOS SiGe technology

✍ Scribed by Voldman, S.; Lanzerotti, L.; Morris, W.; Rubin, L.


Book ID
120609474
Publisher
IEEE
Year
2004
Weight
643 KB
Category
Article
ISBN-13
9780780383159

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