[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Trench transformation technology using hydrogen annealing for realizing highly reliable device structure with thin dielectric films

[IEEE 1998 Symposium on VLSI Technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - CMOS RF modeling for GHz communication IC's

✍ Jia-Jiunn Ou, ; Xiaodong Jin, ; Ma, I.; Chenming Hu, ; Gray, P.R. 📂 Article 📅 1998 🏛 IEEE 🌐 English ⚖ 201 KB

the Symposium On Vlsi Technology Has Alternated Each Year Between Sites In Us And Japan. In 1987, The First Symposium On Vlsi Circuits Was Held In Conjunction With Technology Symposium In Recognition Of The Growing Interest To Provide The Same Small But Tense And Open Forum For Discussing Circuits A

[IEEE 1998 Symposium on VLSI Technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Chemical mechanical polishing: the impact of a new technology on an industry

✍ Perry, K.A. 📂 Article 📅 1998 🏛 IEEE ⚖ 520 KB

[IEEE 1998 Symposium on VLSI Technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Excellent process control technology for highly manufacturable and high performance 0.18 μm CMOS LSIs

✍ Nakayama, T.; Asamura, T.; Kako, M.; Murota, M.; Matsumoto, M.; Washizu, Y.; Tom 📂 Article 📅 1998 🏛 IEEE ⚖ 437 KB

[IEEE 1998 Symposium on VLSI Technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - A new prediction method for oxide lifetime and its application to study dielectric breakdown mechanism

✍ Okada, K.; Kubo, H.; Ishinaga, A.; Yoneda, K. 📂 Article 📅 1998 🏛 IEEE 🌐 English ⚖ 216 KB

the Symposium On Vlsi Technology Has Alternated Each Year Between Sites In Us And Japan. In 1987, The First Symposium On Vlsi Circuits Was Held In Conjunction With Technology Symposium In Recognition Of The Growing Interest To Provide The Same Small But Tense And Open Forum For Discussing Circuits A

[IEEE 1998 Symposium on VLSI Technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - A Cu/low-κ dual damascene interconnect for high performance and low cost integrated circuits

✍ Zhao, B.; Feiler, D.; Ramanathan, V.; Liu, Q.Z.; Brongo, M.; Wu, J.; Zhang, H.; 📂 Article 📅 1998 🏛 IEEE ⚖ 294 KB

[IEEE 1998 Symposium on VLSI Technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Dielectric breakdown, reliability and defect density of (Ba/sub 0.7/Sr/sub 0.3/)TiO/sub 3/ (BST)

✍ Reisinger, H.; Wendt, H.; Beitel, G.; Fritsch, E. 📂 Article 📅 1998 🏛 IEEE ⚖ 281 KB

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