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[IEEE 1996 IEEE Hong Kong Electron Devices Meeting - Hong Kong (29 June 1996)] Proceedings 1996 IEEE Hong Kong Electron Devices Meeting - Properties of Si-SiO/sub 2/ interface traps due to low-energy Ar/sup +/ backsurface bombardment in n-channel nitrided MOSFETs

✍ Scribed by Surya, C.; Wang, W.; Fong, W.K.; Chan, C.H.; Lai, P.T.


Book ID
126673566
Publisher
IEEE
Year
1996
Weight
243 KB
Category
Article
ISBN-13
9780780330917

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