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ICP-RIE etching of self-aligned InP based HBTs with Cl2/N2 chemistry

✍ Scribed by S. Topaloglu; W. Prost; F.-J. Tegude


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
739 KB
Volume
88
Category
Article
ISSN
0167-9317

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