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Hysteresis, time dependence and elbow in the resistivity of EuS

โœ Scribed by Y. Shapira; T.B. Reed

Publisher
Elsevier Science
Year
1971
Tongue
English
Weight
103 KB
Volume
36
Category
Article
ISSN
0375-9601

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Time evolutions of the resist deformation process in thermal nanoimprint have been investigated by numerical simulation and experiments. The simulation and experiments relatively agree with each other in time evolutions of the resist profiles. Dependencies of the process time on both imprint pressur