Hydrogenated Amorphous Silicon: Part A: Preparation and Structure

✍ Scribed by Jacques I. Pankove (Eds.)

• Publisher: Academic Press
• Year: 1984
• Tongue: English
• Leaves: 319
• Series: Semiconductors and Semimetals 21, Part A
• Category: Library

✦ Table of Contents

Content:
Edited by
Page iii

Copyright page
Page iv

List of Contributors
Page xi

Foreword
Pages xiii-xiv
R.K. Willardson, Albert C. Beer

Preface
Page xv
Jacques I. Pankov

Chapter 1 Introduction Original Research Article
Pages 1-5
Jacques I. Pankove

Chapter 2 Glow Discharge Original Research Article
Pages 9-39
Masataka Hirose

Chapter 3 dc Glow Discharge Original Research Article
Pages 41-54
Yoshiyuki Uchida

Chapter 4 Sputtering Original Research Article
Pages 55-82
T.D. Moustakas

Chapter 5 Ionized-Cluster Beam Deposition Original Research Article
Pages 83-107
Isao Yamada

Chapter 6 Chemical Vapor Deposition Original Research Article
Pages 109-122
Masataka Hirose

Chapter 7 Homogeneous Chemical Vapor Deposition Original Research Article
Pages 123-149
Bruce A. Scott

Chapter 8 Chemical Reactions in Plasma Deposition Original Research Article
Pages 153-177
Frank J. Kampas

Chapter 9 Plasma Kinetics Original Research Article
Pages 179-193
Paul A. Longeway

Chapter 10 Diagnostics of Silane Glow Discharges Using Probes and Mass Spectroscopy Original Research Article
Pages 195-222
Herbert A. Weakliem

Chapter 11 Relation between the Atomic and the Electronic Structures Original Research Article
Pages 225-246
Lester Guttman

Chapter 12 Experimental Determination of Structure Original Research Article
Pages 247-271
A. Chenevas-Paule

Chapter 13 Pressure Effects on the Local Atomic Structure Original Research Article
Pages 273-290
S. Minomura

Chapter 14 Defects and Density of Localized States Original Research Article
Pages 291-318
David Adler

Index
Pages 319-326