Hydrogen plasma etching method for depth analysis by x-ray photoelectron spectroscopy

✍ Scribed by Yoshitoki Iijima; Toyohiko Tazawa; Kazuomi Sato; Mitsuyoshi Oshima; Kenzo Hiraoka

• Publisher: John Wiley and Sons
• Year: 2000
• Tongue: English
• Weight: 135 KB
• Volume: 29
• Category: Article
• ISSN: 0142-2421
• DOI: 10.1002/1096-9918(200009)29:9<596::aid-sia904>3.0.co;2-h