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Hydrogen concentration and interface state generation due to ionizing radiation in aluminum and polysilicon gate MOS devices

✍ Scribed by S. Scharf; J. Krauser; M. Störring; F. Wulf; D. Bräunig


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
364 KB
Volume
28
Category
Article
ISSN
0167-9317

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