Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography
✍ Scribed by Tien-Li Chang; Kuei-Yuan Cheng; Ta-Hsin Chou; Chih-Chieh Su; Han-Ping Yang; Shao-Wei Luo
- Book ID
- 104052244
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 523 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nmwavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmosphericpressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process.