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How it really happened: The history of p-type doping of gallium nitride

✍ Scribed by Jain, Rakesh B. ;Maruska, Herbert Paul


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
659 KB
Volume
204
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

The first single crystal thin film layers of gallium nitride (GaN) were grown in 1969, but it was not until 1989 that conducting p‐type films of GaN were finally achieved. Many unsuccessful attempts to produce p‐type GaN by annealing techniques including thermal and electron beam annealing were attempted in those intervening twenty years. We discuss here the reason for the early failures, and how the problems were overcome. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Communicate your view

physica status solidi welcomes correspondence related to the articles in its new Historical Review section. If you wish to comment on the developments and topics recounted here from your own perspective, please send an e‐mail to the editor at [email protected]. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)