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Hot-electron trapping and generic reliability of p+ polysilicon/SiO2/Si structures for fine-line CMOS technology: L. Manchanda. 24 a. Proc. IEEE Reliab. Phys. Symp., 183 (1986)


Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
121 KB
Volume
27
Category
Article
ISSN
0026-2714

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