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Highly strained In0.5Ga0.5P as wide-gap material on InP substrate for heterojunction field effect transistor application

✍ Scribed by F. Scheffer; A. Lindner; Q. Liu; C. Heedt; R. Reuter; W. Prost; H. Lakner; F.J. Tegude


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
581 KB
Volume
145
Category
Article
ISSN
0022-0248

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