Highly sensitive self-developing soft X-ray resists of silicon-containing aldehyde copolymers and sensitive novolac-based composite resists containing aldehyde copolymer
✍ Scribed by Kazuo Nate; Takashi Inoue; Hitoshi Yokono; Koichi Hatada
- Publisher
- John Wiley and Sons
- Year
- 1988
- Tongue
- English
- Weight
- 455 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0021-8995
No coin nor oath required. For personal study only.
✦ Synopsis
Copolymers of aliphatic aldehydes containing a trimethylsilyl group were prepared a t -78°C in toluene using diethylaluminum diphenylamide as an initiator. The copolymer depolymerized into monomeric aldehydes on exposure t o soft X-rays. When the copolymer was used as a soft X-ray resist, almost complete development was accomplished by exposure alone. No development step was required. The soft X-ray sensitivity of poly(3-trimethylsilylpropanal-co-propanal) was 50 mJ/cm2 at the film thickness of 1.0 pm. A composite resist system consisting of a novolac resin and an aldehyde copolymer containing trimethylsilyl groups has also been developed and used as an alkaline-developable positive electron-beam and soft X-ray resist.