Highly sensitive positive deep UV resist utilizing a sulfonate acid generator and a tetrahydropyranyl inhibitor

✍ Scribed by Leo Schlegel; Takumi Ueno; Hiroshi Shiraishi; Nobuaki Hayashi; Takao Iwayanagi

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 281 KB
• Volume: 13
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90042-c