Highly Selective Wet Etch for High-Resolution Three-Dimensional Nanostructures in Arsenic Sulfide All-Inorganic Photoresist

✍ Scribed by Wong, Sean H.; Thiel, Michael; Brodersen, Peter; Fenske, Dieter; Ozin, Geoffrey A.; Wegener, Martin; von Freymann, Georg

• Book ID: 127278486
• Publisher: American Chemical Society
• Year: 2008
• Tongue: English
• Weight: 23 KB
• Volume: 20
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm800624g