Highly selective reactive ion etching applied to the fabrication of low-noise AlGaAs GaAs FET's

✍ Scribed by Vatus, J.; Chevrier, J.; Delescluse, P.; Rochette, J.-F.

• Book ID: 114595607
• Publisher: IEEE
• Year: 1986
• Tongue: English
• Weight: 525 KB
• Volume: 33
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1986.22598