✦ LIBER ✦
Highly selective etching of Si3N4 over SiO2 employing a downstream type reactor: N Hayasaka et al, Solid State Technol, 31, 1988, 127–130
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 142 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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