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Highly robust ultrathin silicon nitride films grown at low-temperature by microwave-excitation high-density plasma for giga scale integration

✍ Scribed by Sekine, K.; Saito, Y.; Hirayama, M.; Ohmi, T.


Book ID
114538205
Publisher
IEEE
Year
2000
Tongue
English
Weight
168 KB
Volume
47
Category
Article
ISSN
0018-9383

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