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Highly concentrated ozone gas supplied at an atmospheric pressure condition as a new oxidizing reagent for the formation of SiO2thin film on Si

✍ Scribed by Kunihiko Koike; Shingo Ichimura; Akira Kurokawa; Ken Nakamura


Book ID
107452822
Publisher
Springer US
Year
2002
Tongue
English
Weight
162 KB
Volume
31
Category
Article
ISSN
0361-5235

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