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High-temperature oxidation of ion implanted tantalum

โœ Scribed by E.N. Kaufmann; R.G. Musket; J.J. Truhan; K.S. Grabowski; C.R. Gossett; I.L. Singer


Publisher
Elsevier Science
Year
1983
Weight
868 KB
Volume
209-210
Category
Article
ISSN
0167-5087

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other unique feature was the ability to introduce Numerous studies have been undertaken during into this surface layer controlled concentrations of most elements. Implantation of an element the last decade examining the potential of ion affected high temperature oxidation in a cornimplantation to im