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High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application

✍ Scribed by Masami Nishikawa; Tomohiko Nakajima; Takaaki Manabe; Takeshi Okutani; Tetsuo Tsuchiya


Book ID
113793691
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
976 KB
Volume
64
Category
Article
ISSN
0167-577X

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