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High temperature and high frequency characteristics of AlGaN/GaN MOS-HFETs with photochemical vapor deposition SiO2 layer

✍ Scribed by C.K. Wang; R.W. Chuang; S.J. Chang; Y.K. Su; S.C. Wei; T.K. Lin; T.K. Ko; Y.Z. Chiou; J.J. Tang


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
187 KB
Volume
119
Category
Article
ISSN
0921-5107

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