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High spatial resolution micro-Raman temperature measurements of nitride devices (FETs and light emitters)

✍ Scribed by Kuball, M. ;Pomeroy, J. W. ;Rajasingam, S. ;Sarua, A. ;Uren, M. J. ;Martin, T. ;Lell, A. ;Härle, V.


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
193 KB
Volume
202
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

The cover picture of the present issue of physica status solidi (a) is a temperature map of a AlGaN/GaN heterostructure field effect transistor (HFET) obtained using micro‐Raman spectroscopy. The inset shows a photograph of the device with source (S), gate (G) and drain (D) positions marked. The paper by M. Kuball et al. [1] is an invited presentation from the International Workshop on Nitride Semiconductors (IWN 2004).

In the Rapid Research Letter by B. Lamprecht et al. [2] the authors report on the successful fabrication and characterization of working organic photodiodes deposited on ordinary newspaper sheets as an example for a flexible and very rough substrate with unfortunate mechanical properties.


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High spatial resolution micro-Raman temp
✍ Kuball, M. ;Pomeroy, J. W. ;Rajasingam, S. ;Sarua, A. ;Uren, M. J. ;Martin, T. ; 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 293 KB

## Abstract Knowledge of the temperature in the active area of III‐nitride semiconductor devices such as AlGaN/GaN HFETs is essential for optimizing device design, performance and reliability, however, direct measurement of this temperature is not readily achieved. Infrared techniques often employe