## Abstract Knowledge of the temperature in the active area of III‐nitride semiconductor devices such as AlGaN/GaN HFETs is essential for optimizing device design, performance and reliability, however, direct measurement of this temperature is not readily achieved. Infrared techniques often employe
High spatial resolution micro-Raman temperature measurements of nitride devices (FETs and light emitters)
✍ Scribed by Kuball, M. ;Pomeroy, J. W. ;Rajasingam, S. ;Sarua, A. ;Uren, M. J. ;Martin, T. ;Lell, A. ;Härle, V.
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 193 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
The cover picture of the present issue of physica status solidi (a) is a temperature map of a AlGaN/GaN heterostructure field effect transistor (HFET) obtained using micro‐Raman spectroscopy. The inset shows a photograph of the device with source (S), gate (G) and drain (D) positions marked. The paper by M. Kuball et al. [1] is an invited presentation from the International Workshop on Nitride Semiconductors (IWN 2004).
In the Rapid Research Letter by B. Lamprecht et al. [2] the authors report on the successful fabrication and characterization of working organic photodiodes deposited on ordinary newspaper sheets as an example for a flexible and very rough substrate with unfortunate mechanical properties.
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