✦ LIBER ✦
High robustness of correlation-based alignment with Penrose patterns to marker damage in electron beam lithography
✍ Scribed by K.E. Docherty; K.A. Lister; J. Romijn; J.M.R. Weaver
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 359 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0167-9317
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