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High-resolution X-ray diffraction as a tool to investigate the evolution of local stress in sub-micrometric Si lines isolated by periodic arrays of oxide-filled trenches

✍ Scribed by S. Escoubas; M. Eberlein; P. Rohr; O. Thomas


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
466 KB
Volume
12
Category
Article
ISSN
1369-8001

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